Evaporation Materials
E FORU offers high purity evaporation materials at a competitive price. We have a large number of various evaporation materials in stock and provide customized services. Materials are often packaged within the sizes required.
Código de producto : EM-Sc2O3-5N-Cu
Scandium oxide (Sc2O3) is an evaporating material that can be used in the production of coatings and thin films. It has a melting point of over 2500°C and a vapor pressure of approximately 10-5 torr. Sc2O3 has very good electrical and thermal conductivities, making it suitable for many coating applications.
Código de producto : EM-Sm2O3-5N-Cu
Samarium oxide (Sm2O3) is a high vapor-pressure evaporation material which is commonly used for optical thin film and vacuum deposition processes. It is a white, odorless powder and has excellent optical properties. It is a corrosive material, highly volatile and can be used to produce thin films over substrates such as glass and metal surfaces.
Código de producto : EM-Pr6O11-5N-Cu
Praseodymium oxide (Pr6O11) is a highly refractory inorganic compound with a melting point of 2,650°C and a boiling point of 4,160°C. It is a yellow-orange powder that is insoluble in water, but is soluble in alkaline solutions.
Código de producto : EM-(Pr(TiO3)2)-5N-Cu
Praseodymium titanate or Pr(TiO3)2 is an inorganic compound of praseodymium and titanium oxides and is used as an evaporation material for physical vapor deposition (PVD). It has an interesting optical property where it exhibits higher reflectivity for certain spectral bands in its visible spectrum.
Código de producto : EM-Nb2O5-5N-Cu
Niobium pentoxide (Nb2O5) is a widely used evaporation material in thin film deposition. It is used as an evaporation source material to deposit thin films of metal oxides such as niobium dioxide (NbO2). Niobium pentoxide is also used in optical thin film applications and in the preparation of protective coatings.
Código de producto : EM-NiO-5N-Cu
Nickel Oxide (NiO) is an inorganic compound used as an evaporation material, which is most commonly employed in processes that require either the deposition or protection of metal or semiconductor surfaces. It is a black crystalline material that is available in flake, powder or pressed pellet form.